Chih-I Wei
at Siemens Industry Software
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Calibration, Inspection, 3D modeling, Scanning electron microscopy, Time metrology, Optical proximity correction, Semiconducting wafers

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Statistical analysis, Data modeling, Calibration, Photons, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Failure analysis, Stochastic processes

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, 3D modeling, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Phase shifting, Logic, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF, Nanoimprint lithography

Proceedings Article | 3 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Modulation, Silicon, Photoresist materials, Finite element methods, Photomasks, Integrated optics, Molybdenum, Photoresist processing, Semiconducting wafers

Showing 5 of 7 publications
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