Dr. Chih-Ming Ke
Academician/Dept Manager at
SPIE Involvement:
Senior status | Conference Program Committee | Author
Publications (36)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Diffraction, Metrology, Optical lithography, Image registration, Scatterometry, Optical metrology, Time metrology, Process control, High volume manufacturing, Target acquisition, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Target detection, Wafer-level optics, Thin films, Diffraction, Metrology, Detection and tracking algorithms, Polarization, Image quality, Solids, Process control, Semiconducting wafers, Defense systems, Overlay metrology, Diffraction gratings

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Optical lithography, Data modeling, Calibration, Scanners, Interfaces, Inspection, Photoresist materials, Process control, Finite element methods, Semiconducting wafers

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Metrology, Optical lithography, Image processing, Process control, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Performance modeling, 193nm lithography

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Diffraction, Metrology, Etching, Scanners, Process control, Semiconducting wafers, Overlay metrology, Back end of line, Front end of line

PROCEEDINGS ARTICLE | May 13, 2013
Proc. SPIE. 8788, Optical Measurement Systems for Industrial Inspection VIII
KEYWORDS: Wafer-level optics, Semiconductors, Diffraction, Metrology, Sensors, Geometrical optics, Semiconducting wafers, Environmental sensing, Overlay metrology, Diffraction gratings

Showing 5 of 36 publications
Conference Committee Involvement (12)
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVIII
24 February 2014 | San Jose, California, United States
Showing 5 of 12 published special sections
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