Dr. Chih-Tung Hsu
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Visualization, Databases, Manufacturing, Inspection, Inspection equipment, Photomasks, Semiconductor manufacturing, Optical proximity correction, Computer aided design, Electronic design automation

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