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Dr. Chih-Yu Hsu
at Air Liquide Labs
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Author
Publications (1)
Proceedings Article | 20 March 2019 Paper
Ultrahigh selective etching of Si3N4 over SiO2 using plasma-less dry process for 3D-NAND device applications
Proceedings Volume 10963, 109630M (2019) https://doi.org/10.1117/12.2504426
KEYWORDS: Etching, Silicon, Semiconducting wafers, Chemistry, Dry etching, Silica, Plasma etching, Temperature metrology, Isotropic etching, High aspect ratio silicon micromachining
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