Dr. Chikaaki Kodama Profile

Dr. Chikaaki Kodama

Chief Specialist at KIOXIA Corp

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 10 April 2024 Presentation + Paper

Transistor profiling for quantitative evaluation of variability in transistor characteristics due to layout dependent effects (LDEs)

Piyush Pathak, Mikiyasu Yamaji, Hiroshi Kitahara, Akira Hokazono, Shigeki Nojima, Kimiko Ichikawa, Jac Paul Condella, Michel Cote, Ya-Chieh Lai, Philippe Hurat, Chikaaki Kodama

Proceedings Volume 12954, 1295403 (2024) https://doi.org/10.1117/12.3010201

KEYWORDS: Transistors, Profiling, Design, Device simulation, Image classification, Matrices, Very large scale integration, Computer simulations, CMOS technology

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Proceedings Article | 21 November 2023 Poster + Paper

A formulation of mask optimization into QUBO model for Ising machines

Yukihide Kohira, Haruki Nakayama, Naoki Nonaka, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama

Proceedings Volume 12751, 127511D (2023) https://doi.org/10.1117/12.2687615

KEYWORDS: Source mask optimization, Tolerancing, Optical proximity correction, Semiconducting wafers, SRAF, Quantum annealing

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Proceedings Article | 23 March 2020 Paper

A feature selection method for weak classifier based hotspot detection

Hidekazu Takahashi, Hiroki Ogura, Shimpei Sato, Atsushi Takahashi, Chikaaki Kodama

Proceedings Volume 11328, 113281E (2020) https://doi.org/10.1117/12.2559358

KEYWORDS: Feature extraction, Feature selection, Lithography, Simulation of CCA and DLA aggregates, Machine learning, Manufacturing, Computer programming, Semiconducting wafers, Design for manufacturability, Very large scale integration

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Proceedings Article | 23 March 2020 Presentation + Paper

Process variation-aware mask optimization with iterative improvement by subgradient method and boundary ﬂipping

Rina Azuma, Yukihide Kohira, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama

Proceedings Volume 11328, 113280O (2020) https://doi.org/10.1117/12.2552514

KEYWORDS: Photomasks, Image processing, Source mask optimization, Optical proximity correction, Mathematical modeling, Model-based design, Lithography, SRAF, System on a chip, Resolution enhancement technologies

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SPIE Journal Paper | 11 March 2016

Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process

Yukihide Kohira, Chikaaki Kodama, Tomomi Matsui, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka

JM3, Vol. 15, Issue 02, 021207, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021207

KEYWORDS: Computer engineering, Photomasks, Optical lithography, Double patterning technology, Computer programming, Overlay metrology, Detection and tracking algorithms, Communication engineering, Lithography, Logic

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Proceedings Article | 26 March 2015 Paper

Self-aligned quadruple patterning-compliant placement

Fumiharu Nakajima, Chikaaki Kodama, Koichi Nakayama, Shigeki Nojima, Toshiya Kotani

Proceedings Volume 9427, 942708 (2015) https://doi.org/10.1117/12.2085705

KEYWORDS: Photomasks, Optical lithography, Lithography, Image processing, Double patterning technology, Semiconducting wafers, Metals, Standards development, Semiconductors, Manufacturing

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Proceedings Article | 26 March 2015 Paper

Yield-aware mask assignment using positive semi-definite relaxation in LELECUT triple patterning

Yukihide Kohira, Chikaaki Kodama, Tomomi Matsui, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka

Proceedings Volume 9427, 94270B (2015) https://doi.org/10.1117/12.2085285

KEYWORDS: Photomasks, Optical lithography, Lithography, Overlay metrology, Double patterning technology, Computer programming, Design for manufacturability, Fabrication, Extreme ultraviolet, Logic

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Proceedings Article | 28 March 2014 Paper

Localization concept of re-decomposition area to fix hotspots for LELE process

Yoko Yokoyama, Keishi Sakanushi, Yukihide Kohira, Atsushi Takahashi, Chikaaki Kodama, Satoshi Tanaka, Shigeki Nojima

Proceedings Volume 9053, 90530V (2014) https://doi.org/10.1117/12.2046263

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Double patterning technology, Optical simulations, Semiconducting wafers, Optical lithography, Etching, Design for manufacturing, Design for manufacturability

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Proceedings Article | 28 March 2014 Paper

Self-aligned quadruple patterning-aware routing

Fumiharu Nakajima, Chikaaki Kodama, Toshiya Kotani, Shigeki Nojima, Koichi Nakayama, Hirotaka Ichikawa

Proceedings Volume 9053, 90530C (2014) https://doi.org/10.1117/12.2046241

KEYWORDS: Photomasks, Double patterning technology, Optical lithography, Lithography, Metals, Semiconducting wafers, Logic, Manufacturing, Semiconductors, Microelectronics

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Proceedings Article | 28 March 2014 Paper

Yield-aware decomposition for LELE double patterning

Yukihide Kohira, Yoko Yokoyama, Chikaaki Kodama, Atsushi Takahashi, Shigeki Nojima, Satoshi Tanaka

Proceedings Volume 9053, 90530T (2014) https://doi.org/10.1117/12.2046180

KEYWORDS: Legal, Double patterning technology, Photomasks, Semiconducting wafers, Manufacturing, Lithography, Detection and tracking algorithms, Optical proximity correction, Image quality, Extreme ultraviolet

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Proceedings Article | 29 March 2013 Paper

Detailed routing with advanced flexibility and in compliance with self-aligned double patterning constraints

Hirotaka Ichikawa, Fumiharu Nakajima, Toshiya Kotani, Chikaaki Kodama, Koichi Nakayama, Shinji Miyamoto, Shigeki Nojima, Shoji Mimotogi

Proceedings Volume 8684, 86840A (2013) https://doi.org/10.1117/12.2010644

KEYWORDS: Image processing, Semiconducting wafers, Lithography, Photomasks, Double patterning technology, Optical lithography, Manufacturing, Overlay metrology, Metals, Optical resolution

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Proceedings Article | 15 March 2012 Paper

Self-aligned double and quadruple patterning layout principle

Shoji Mimotogi, Toshiya Kotani, Chikaaki Kodama, Shigeki Nojima, Shinji Miyamoto, Koichi Nakayama

Proceedings Volume 8327, 83270V (2012) https://doi.org/10.1117/12.916678

KEYWORDS: Double patterning technology, Photomasks, Lithography, Optical lithography, Semiconducting wafers, Manufacturing, Image processing, Etching, Silicon, Design for manufacturability

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Proceedings Article | 15 March 2012 Paper

Clean pattern matching for full chip verification

Shinji Miyamoto, Chikaaki Kodama, Satomi Nakamura, Tetsuaki Matsunawa, Shigeki Nojima, Nozomu Furuta, Shunsuke Kagaya, Takanori Urakami

Proceedings Volume 8327, 83270T (2012) https://doi.org/10.1117/12.916316

KEYWORDS: Lithography, Data storage, Optical proximity correction, Microelectronics, Design for manufacturability, Current controlled current source, Intellectual property, Time metrology

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Proceedings Article | 10 March 2010 Paper

Novel fine-tuned model-based SRAF generation method using coherence map

Soichi Inoue, Toshiya Kotani, Shoji Mimotogi, Katsuyoshi Kodera, Satoshi Tanaka, Shigeki Nojima, Chikaaki Kodama, Mikiyasu Yamaji, Koji Hashimoto

Proceedings Volume 7640, 764017 (2010) https://doi.org/10.1117/12.846322

KEYWORDS: Modulation, SRAF, Photovoltaics, Photomasks, Lithography, Model-based design, Lithographic illumination, Optical proximity correction, Coherence (optics), Fourier transforms

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Showing 5 of 14 publications

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