Chimaobi Mbanaso
Ph.D. Student at SUNY CNSE/SUNYIT
SPIE Involvement:
Author
Publications (12)

SPIE Journal Paper | May 10, 2012
JM3 Vol. 11 Issue 02
KEYWORDS: Absorption, Gas lasers, Molecules, Infrared radiation, Extreme ultraviolet, Carbon monoxide, Photons, Optical filters, Plasma, Molecular lasers

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Polymers, Polymerization, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Polymer thin films, EUV optics

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Polymers, Spectroscopy, Ultraviolet radiation, Diffusion, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Surface conduction electron emitter displays, Polymer thin films

PROCEEDINGS ARTICLE | March 29, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Optical filters, Photons, Molecules, Gases, Carbon dioxide lasers, Infrared radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Absorption

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Mirrors, Contamination, Titanium dioxide, Error analysis, Xenon, Extreme ultraviolet, Extreme ultraviolet lithography, Neodymium, Ruthenium

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Lithography, Contamination, Inspection, Reflectivity, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 12 publications
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