Mr. Chin-Cheng Yang
Manager at Macronix International Co Ltd
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Optical lithography, Defect detection, Etching, Image processing, Scanners, Diffusion, Distortion, Scanning electron microscopy, Process control, Compact discs, Critical dimension metrology, Semiconducting wafers, Temperature metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Reticles, Optical lithography, Modulation, Photomasks, SRAF, Critical dimension metrology, Imaging arrays, Semiconducting wafers, Array processing

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Optical lithography, Image processing, Manufacturing, Electroluminescence, Photomasks, Immersion lithography, Source mask optimization, SRAF, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Etching, Satellites, Polymers, Distortion, Photomasks, Double patterning technology, Photoresist processing, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Optical lithography, Etching, Satellites, Polymers, Inspection, Photomasks, Photoresist processing, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical lithography, Etching, Image segmentation, Scanners, Signal processing, Photomasks, Double patterning technology, Optical alignment, Semiconducting wafers, Double positive medium

Showing 5 of 13 publications
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