Chin-Teong Lim
at GLOBALFOUNDRIES Dresden
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 29 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Photomasks, Printing, Calibration, Feedback loops, Metrology, Scanning electron microscopy, Image processing

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Scanners, Semiconducting wafers, Optical proximity correction, Critical dimension metrology, Metals, Reticles, Photomasks, Tolerancing, Calibration, Binary data

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Metals, Manufacturing, Electron beams, Etching, Binary data, Neodymium

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Optical proximity correction, Source mask optimization, Scanners, Lithography, Photomasks, Manufacturing, Photovoltaics, Fiber optic illuminators, Reticles, Resolution enhancement technologies

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Optical proximity correction, Photomasks, Lithography, Photovoltaics, Inspection, Manufacturing, Logic, 193nm lithography, Optical lithography, Reticles

Showing 5 of 11 publications
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