Chin-Teong Lim
at GLOBALFOUNDRIES Dresden
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 29 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Metrology, Calibration, Image processing, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, Feedback loops, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Reticles, Calibration, Metals, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Binary data

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beams, Reticles, Etching, Metals, Manufacturing, Optical proximity correction, Critical dimension metrology, Neodymium, Semiconducting wafers, Binary data

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Reticles, Scanners, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 4 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Photovoltaics, Reticles, Logic, Optical lithography, Manufacturing, Inspection, Photomasks, Optical proximity correction, 193nm lithography

Showing 5 of 11 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top