Mr. Chin-kuei Chang
at United Microelectronic Corp.
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Image registration, Pellicles, Photomasks, Double patterning technology, Source mask optimization, Semiconducting wafers, Overlay metrology, 193nm lithography

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