Chin-Kuei Chang
Section manager at United Semiconductor (Xiamen) Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Reticles, Manufacturing, Inspection, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Image registration, Pellicles, Photomasks, Double patterning technology, Source mask optimization, Semiconducting wafers, Overlay metrology, 193nm lithography

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top