Chin Le
Principal Engineer at Micron Technology Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Reticles, Defect detection, Opacity, Databases, Inspection, Feature extraction, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Defect detection, Opacity, Databases, Inspection, Feature extraction, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Manufacturing, Optical proximity correction, Analog electronics, Optimization (mathematics), Photomask technology, System on a chip, Resolution enhancement technologies, Ranging, Chemical mechanical planarization

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