Ching-Heng Wang
at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Glasses, Image acquisition, Pellicles, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Optical lithography, Image processing, Control systems, Distortion, Semiconductor manufacturing, Optical proximity correction, Feedback control, Optical calibration, Tolerancing, Resolution enhancement technologies

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Databases, Design for manufacturing, Photomasks, Optical proximity correction, Environmental sensing, Performance modeling, Model-based design, Process modeling, Resolution enhancement technologies

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Visualization, Silicon, Manufacturing, Transistors, Optical proximity correction, Critical dimension metrology, Yield improvement, Process modeling, Resolution enhancement technologies, Design for manufacturability

Proceedings Article | 31 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Roads, Visualization, Databases, Bridges, Photomasks, Semiconductor manufacturing, Optical proximity correction, Mask making, Critical dimension metrology, Resolution enhancement technologies

Showing 5 of 14 publications
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