Ching-Yu Chang
Deputy Director at Taiwan Semiconductor Manufacturing Co Ltd
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Author
Publications (16)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Extreme ultraviolet, Systems modeling, Monte Carlo methods, Polymers, Molecules, Oxygen, Diffusion, Chemical species, Extreme ultraviolet lithography, Ions

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Directed self assembly, Polymethylmethacrylate, Picosecond phenomena, Etching, Scanning electron microscopy, Oxides, Optical lithography, Double patterning technology, Bridges, Polymers

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Photomasks, Polymers, Semiconducting wafers, Finite element methods, Photoresist processing, Defect inspection, Quantitative analysis, Organic materials, Silicon

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Coating, Polymers, Lithography, Silicon, Photoresist processing, FT-IR spectroscopy, Diffusion, Prototyping, Chemical analysis, Semiconductor manufacturing

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Polymers, Diffusion, Line width roughness, Optics manufacturing, Scattering, Printing, Semiconductor manufacturing, Resolution enhancement technologies, Inspection, Immersion lithography

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Electrons, Metals, Polymers, Scanning electron microscopy, Electron beam lithography, Monte Carlo methods, Polymer thin films, Critical dimension metrology, Resistance, Photomasks

Showing 5 of 16 publications
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