Ching-Yu Chang
Deputy Director at Taiwan Semiconductor Manufacturing Co Ltd
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Author
Publications (16)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Chemical species, Polymers, Molecules, Ions, Diffusion, Oxygen, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Systems modeling

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Oxides, Optical lithography, Polymethylmethacrylate, Etching, Polymers, Scanning electron microscopy, Bridges, Directed self assembly, Double patterning technology, Picosecond phenomena

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Polymers, Silicon, Quantitative analysis, Organic materials, Finite element methods, Photomasks, Photoresist processing, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, FT-IR spectroscopy, Polymers, Silicon, Diffusion, Coating, Semiconductor manufacturing, Chemical analysis, Photoresist processing, Prototyping

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Scattering, Polymers, Diffusion, Inspection, Printing, Line width roughness, Semiconductor manufacturing, Immersion lithography, Optics manufacturing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Electron beam lithography, Polymers, Metals, Electrons, Resistance, Scanning electron microscopy, Monte Carlo methods, Photomasks, Critical dimension metrology, Polymer thin films

Showing 5 of 16 publications
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