Dr. Chisun Hong
at FUJIFILM Electronic Materials USA Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: CMOS sensors, Transparency, Optical lithography, Diffusion, Scanning electron microscopy, Photoresist materials, Image sensors, Charge-coupled devices, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical lithography, Cadmium, Polymers, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Etching, Dry etching, Polymers, Resistance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Resist chemistry

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