Dr. Chisun Hong Profile

Dr. Chisun Hong

at FUJIFILM Electronic Materials USA Inc

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Publications (3)

PROCEEDINGS ARTICLE | March 20, 2012

KrF resists for implant layers patterning extreme high-aspect ratio structures with a double focal plane exposure technique

Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX

KEYWORDS: CMOS sensors, Transparency, Optical lithography, Diffusion, Scanning electron microscopy, Photoresist materials, Image sensors, Charge-coupled devices, Photoresist processing, Semiconducting wafers

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PROCEEDINGS ARTICLE | May 4, 2005

Effect of hard bake process on LER

Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII

KEYWORDS: Optical lithography, Cadmium, Polymers, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Chemically amplified resists

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PROCEEDINGS ARTICLE | May 14, 2004

PEB sensitivity studies of ArF resists: II. Polymer and solvent effects

Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI

KEYWORDS: Lithography, Etching, Dry etching, Polymers, Resistance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Resist chemistry

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