Dr. Chisun Hong Profile

Dr. Chisun Hong

at FUJIFILM Electronic Materials USA Inc

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Author

Publications (3)

Proceedings Article | 20 March 2012

KrF resists for implant layers patterning extreme high-aspect ratio structures with a double focal plane exposure technique

Giorgio Rafaelli, Fabio Ferri, Stefano Volpi, Chisun Hong

Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX

KEYWORDS: CMOS sensors, Transparency, Optical lithography, Diffusion, Scanning electron microscopy, Photoresist materials, Image sensors, Charge-coupled devices, Photoresist processing, Semiconducting wafers

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Proceedings Article | 4 May 2005

Effect of hard bake process on LER

Munirathna Padmanaban, David Rentkiewicz, SangHo Lee, Chisun Hong, Dongkwan Lee, Dalil Rahman, Raj Sakamuri, Ralph Dammel

Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII

KEYWORDS: Optical lithography, Cadmium, Polymers, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Chemically amplified resists

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Proceedings Article | 14 May 2004

PEB sensitivity studies of ArF resists: II. Polymer and solvent effects

Chi-Sun Hong, Sang-Ho Lee, Woo-Kyu Kim, Takanori Kudo, Allen Timko, Douglas Mckenzie, Clement Anyadiegwu, Dalil Rahman, Guanyang Lin, Ralph Dammel, Munirathna Padmanaban

Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI

KEYWORDS: Lithography, Etching, Dry etching, Polymers, Resistance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Resist chemistry

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