Dr. Chiyan Kuan
at Hermes-Microvision Inc USA
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | October 18, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Metrology, Liquid phase epitaxy, Error analysis, Inspection, Photomasks, Extreme ultraviolet, Cadmium sulfide, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Wafer-level optics, Defect detection, Inspection, Optical inspection, Nonlinear optics, Wafer inspection, Photomasks, Extreme ultraviolet, Optical simulations, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Defect detection, Inspection, Reflectivity, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Ruthenium

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Defect detection, Opacity, Particles, Manufacturing, Inspection, Electronic components, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Defect detection, Opacity, Inspection, Scanning electron microscopy, Optical inspection, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Defect detection, Opacity, Silicon, Inspection, Scanning electron microscopy, Solids, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 7 publications
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