Dr. Chris H. Clifford
Staff Software Development Engineer at Mentor, a Siemens Business
SPIE Involvement:
Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author
Area of Expertise:
Computational Lithography
Websites:
Profile Summary

I am working as a developer in the Calibre division at Mentor Graphics in Fremont, CA.
Publications (31)

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Failure analysis, Critical dimension metrology, Lithography, Logic, Manufacturing, Photomasks, Error analysis, Stochastic processes, Visualization, Optical proximity correction

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Optical proximity correction, Photomasks, SRAF, Extreme ultraviolet, Image quality, Extreme ultraviolet lithography, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Optical proximity correction, Wavefronts, Extreme ultraviolet, Scanners, Photomasks, Error analysis, Extreme ultraviolet lithography, Manufacturing, 3D modeling, Tolerancing

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Finite-difference time-domain method, Wafer-level optics, Systems modeling, Extreme ultraviolet lithography, Projection systems, Scanners, Electromagnetism

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference

Showing 5 of 31 publications
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