Chris L. Cohan
at SEMATECH Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Oxides, Lithography, Etching, Scanning electron microscopy, Photomasks, Photoresist processing, Semiconducting wafers, 193nm lithography, Resolution enhancement technologies, Phase shifts

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