Dr. Chris A. Mack
CTO at Fractilia LLC
SPIE Involvement:
Author | Instructor
Area of Expertise:
Photolithography , Modeling , Microlithography , Stochastic Modeling
Profile Summary

Chris A. Mack received Bachelor of Science degrees in physics, chemistry, electrical engineering, and chemical engineering from Rose-Hulman Institute of Technology in 1982, a Master of Science degree in electrical engineering from the University of Maryland in 1989, and a Ph.D. in chemical engineering from the University of Texas at Austin in 1998. Mr. Mack founded FINLE Technologies, the developer of the lithography simulation software PROLITH, in 1990, serving as President and Chief Technical Officer until the acquisition of FINLE by KLA-Tencor in 2000. For the next five years he served as Vice President of Lithography Technology for KLA-Tencor. In 2003 he received the SEMI Award for North America for his efforts in lithography simulation and education. He became a fellow of SPIE in 2006, and a fellow of IEEE in 2010. In 2009 he received the SPIE Frits Zernike Award for Microlithography. He is also an adjunct faculty member at the University of Texas at Austin and spent the Fall 2006 semester as a visiting professor at the University of Notre Dame. He has recently completed a comprehensive graduate-level textbook on optical lithography, Fundamental Principles of Optical Lithography, published in late 2007. In 2012 he became Editor-In-Chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3). In 2017 he cofounded Fractilia, where he now works as Chief Technical Officer developing metrology solutions for the measurement of roughness.
Publications (242)

Proceedings Article | 10 April 2024 Presentation + Paper
Chris Mack, Gurpreet Singh, Florian Gstrein
Proceedings Volume 12953, 129530B (2024) https://doi.org/10.1117/12.3011711
KEYWORDS: Extreme ultraviolet, Stochastic processes, Optical lithography, Overlay metrology, Critical dimension metrology, Modeling, Error analysis, Directed self assembly

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129551A (2024) https://doi.org/10.1117/12.3011706
KEYWORDS: Line width roughness, Metrology, Critical dimension metrology, Stochastic processes, Semiconducting wafers, Defect inspection, Measurement uncertainty, Calibration, High volume manufacturing

Proceedings Article | 10 April 2024 Presentation + Paper
Pulkit Saksena, Michael Thompson, Sinan Selcuk, Anupam K. C., Jonathan Pegan, Alexander Hryn, Jinnie Aloysius, Sandip Argekar, Mohan Yadav, Abhishek Agrawal, Todd Hoppe, Sarthak Havelia, Chris Mack, Martin McCallum, Charles Wallace
Proceedings Volume 12955, 129550M (2024) https://doi.org/10.1117/12.3010906
KEYWORDS: Line width roughness, Optical lithography, Scanners, Photoresist materials, Light sources and illumination, Extreme ultraviolet lithography

Proceedings Article | 10 April 2024 Presentation + Paper
Benjamin Bunday, Chris Mack, Shari Klotzkin, Douglas Patriarche, Yvette Ball
Proceedings Volume 12955, 129551T (2024) https://doi.org/10.1117/12.3012881
KEYWORDS: Scanning electron microscopy, Monte Carlo methods, Silicon, Polymethylmethacrylate, Data modeling, Visualization, Metrology

Proceedings Article | 22 November 2023 Presentation
Proceedings Volume PC12750, PC127500D (2023) https://doi.org/10.1117/12.2688228
KEYWORDS: Stochastic processes, Metrology, Modeling, Uncertainty analysis, Ranging, Optical lithography, Lithography, Failure analysis, Error analysis, Critical dimension metrology