Chris Nelson
Applications Engineer at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Wafer-level optics, Reticles, Metrology, Data modeling, Calibration, Image processing, Scanners, Finite element methods, Semiconducting wafers, Wafer testing

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Statistical analysis, Metals, Image processing, Diagnostics, Process control, Semiconducting wafers, Overlay metrology, Process modeling, Visibility

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Nano opto mechanical systems, Data modeling, Scanners, Scanning electron microscopy, Finite element methods, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Standards development

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Optical design, Metrology, Optical lithography, Data modeling, Metals, Image segmentation, Semiconducting wafers, Overlay metrology, Imaging metrology

PROCEEDINGS ARTICLE | June 2, 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Lithography, Optical lithography, Defect detection, Visualization, Particles, Inspection, Interference (communication), Optical inspection, Signal processing, Semiconducting wafers

PROCEEDINGS ARTICLE | June 14, 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Oxides, Polymers, Metals, Copper, Signal processing, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Showing 5 of 6 publications
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