Chris Nelson
Applications Engineer at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Wafer-level optics, Reticles, Metrology, Data modeling, Calibration, Image processing, Scanners, Finite element methods, Semiconducting wafers, Wafer testing

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Statistical analysis, Metals, Image processing, Diagnostics, Process control, Semiconducting wafers, Overlay metrology, Process modeling, Visibility

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Metrology, Nano opto mechanical systems, Data modeling, Scanners, Scanning electron microscopy, Finite element methods, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Standards development

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Optical design, Metrology, Optical lithography, Data modeling, Metals, Image segmentation, Semiconducting wafers, Overlay metrology, Imaging metrology

Proceedings Article | 2 June 2000 Paper
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Lithography, Optical lithography, Defect detection, Visualization, Particles, Inspection, Interference (communication), Optical inspection, Signal processing, Semiconducting wafers

Showing 5 of 6 publications
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