Christopher S. Ngai
Senior Director, Patterning Program at Applied Materials Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (34)

Proceedings Article | 16 October 2017 Presentation + Paper
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Amorphous silicon, Optical lithography, Etching, Photoresist materials, Silicon, Head-mounted displays, Silicon films, Chemical vapor deposition, Extreme ultraviolet, Physical vapor deposition

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Inspection, Polarization, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Lithography, Photomasks, Signal to noise ratio, Wafer inspection, Metrology

Proceedings Article | 27 March 2014 Paper
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Photoresist materials, Optical lithography, Etching, Lithography, Semiconducting wafers, Silicon, System on a chip, Double patterning technology, Manufacturing, Reflectivity

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Optical alignment, Etching, Back end of line, Metals, Copper, Double patterning technology, Chemical mechanical planarization, Scanners, Neodymium, Optical lithography

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Etching, Extreme ultraviolet, Reticles, Critical dimension metrology, Optical lithography, Line width roughness, Manufacturing, Overlay metrology

Showing 5 of 34 publications
Conference Committee Involvement (14)
International Conference on Extreme Ultraviolet Lithography 2021
26 September 2021 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2020
21 September 2020 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2019
16 September 2019 | Monterey, California, United States
Showing 5 of 14 Conference Committees
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