Ki-Yeop Chris Park
Senior Eng'r at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (20)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Electron beam lithography, Metrology, Defect detection, Metals, Scanners, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Target detection, Diffraction, Metrology, Optical lithography, Error analysis, Electron microscopes, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Target detection, Lithography, Reticles, Metrology, Optical lithography, Etching, Optical proximity correction, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Imaging systems, Image processing, Scanners, Control systems, Finite element methods, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Diffraction, Reticles, Data modeling, Calibration, Scanners, Wavefronts, Control systems, 3D modeling, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Metrology, Diffractive optical elements, Cadmium, Data modeling, Birefringence, Scanners, Computational lithography, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Showing 5 of 20 publications
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