Chris Strolenberg
at ASML Netherlands BV
SPIE Involvement:
Publications (3)

Proceedings Article | 24 March 2017 Presentation + Paper
Du Hyun Beak, Ju Hee Shin, Tony Park, Dong Kyeng Han, Jin Phil Choi, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Peter Nikolsky, Chris Strolenberg, Noh-Kyoung Park, Khalid Elbattay, Vito Tomasello, Austin Peng, Anand Guntuka, Zhao-Ze Li, Ronald Goossens, Machi Ryu, Jangho Shin, Chung-Yong Kim, Andrew Moe, Yun-A Sung
Proceedings Volume 10147, 101470A (2017)
KEYWORDS: Critical dimension metrology, Scanners, Lithographic illumination, Image processing, Process control, Computational lithography, Semiconducting wafers, Data modeling, Metrology, Photomasks, Calibration, Finite element methods, Laser scanners, 3D scanning

SPIE Journal Paper | 18 March 2013
JM3, Vol. 12, Issue 02, 021006, (March 2013)
KEYWORDS: Photomasks, Reticles, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Cadmium, Reflectivity, Scanners, Semiconductors

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 85220P (2012)
KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Scanners, Reflectivity, Cadmium, Semiconductors

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