Dr. Christelle Charpin-Nicolle
Research Engineer at CEA-LETI
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 April 2008 Paper
C. Charpin-Nicolle, M. Irmscher, M. Pritschow, B. Vratzov, H. van Vossen, J. Chiaroni, J. Massin, P. Gubbini
Proceedings Volume 6921, 69212I (2008) https://doi.org/10.1117/12.790732
KEYWORDS: Etching, Nanoimprint lithography, Plasma, Semiconducting wafers, Silicon, Chlorine, Scanning electron microscopy, Chromium, Ultraviolet radiation, Optical alignment

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69242G (2008) https://doi.org/10.1117/12.772584
KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Interferometers, Scanners, Interferometry, Lithography, Image processing, Photoresist materials, Modulation, Semiconducting wafers

Proceedings Article | 6 December 2004 Paper
Christelle Charpin Nicolle, Vincent Farys, Beatrice Biasse, Jean-Francois Damlencourt, Jean Yves Robic
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569266
KEYWORDS: Reflectivity, Extreme ultraviolet, Silicon, Deep ultraviolet, Etching, Annealing, Photomasks, Wet etching, EUV optics, Molybdenum

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