Dr. Christelle Charpin-Nicolle
Research Engineer at CEA-LETI
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Etching, Ultraviolet radiation, Silicon, Chromium, Scanning electron microscopy, Nanoimprint lithography, Optical alignment, Chlorine, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Modulation, Interferometers, Image processing, Scanners, Interferometry, Photoresist materials, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Deep ultraviolet, Etching, Annealing, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Wet etching, Molybdenum, EUV optics

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top