Christer Rydberg
Lithography Engineer at Micronic Laser Systems AB
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical filters, Metrology, Speckle, Molecules, Speckle pattern, Photomasks, Line width roughness, Transistors, Line edge roughness, Fiber optic illuminators

SPIE Journal Paper | July 1, 2006
JM3 Vol. 5 Issue 03
KEYWORDS: Speckle, Line edge roughness, Nanoimprint lithography, Lithography, Excimer lasers, Stochastic processes, Spatial coherence, Fiber optic illuminators, Projection lithography, Optical lithography

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Temporal coherence, Lithography, Speckle, Photomasks, Excimer lasers, Nanoimprint lithography, Line edge roughness, Stochastic processes, Projection lithography, Fiber optic illuminators

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