Christian Buergel
Senior Member of Technical Staff at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Area of Expertise:
Electron beam patterning , Resist processing , Mask process corrections
Publications (22)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Semiconductors, Etching, Manufacturing, Quality measurement, Scanning electron microscopy, Photomasks, Machine learning, Convolution, Critical dimension metrology, Environmental sensing

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Data modeling, Visualization, Optical inspection, Data processing, Solids, Process control, Machine learning, Critical dimension metrology, Data centers, Performance modeling

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Thin films, Electron beam lithography, Electron beams, Electrons, Materials processing, Scatterometry, Photomasks, Optical proximity correction, Critical dimension scanning electron microscopy, Critical dimension metrology, Photoresist processing

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Calibration, Etching, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Critical dimension metrology

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Electronics, Inspection, Scanning electron microscopy, Photomasks, Line width roughness, SRAF, Critical dimension metrology, Binary data, Standards development

Showing 5 of 22 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top