Christian Buergel
Senior Member of Technical Staff at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Area of Expertise:
Electron beam patterning , Resist processing , Mask process corrections
Publications (24)

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Semiconductors, Etching, Manufacturing, Quality measurement, Scanning electron microscopy, Photomasks, Machine learning, Convolution, Critical dimension metrology, Environmental sensing

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Data modeling, Visualization, Optical inspection, Data processing, Solids, Process control, Machine learning, Critical dimension metrology, Data centers, Performance modeling

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Detection and tracking algorithms, Data modeling, Visualization, Optical inspection, Data processing, Solids, Process control, Machine learning, Critical dimension metrology, Data centers

Proceedings Article | 12 November 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Cadmium, Data modeling, Calibration, Etching, Scanning electron microscopy, Photomasks, Double patterning technology, SRAF, Vestigial sideband modulation

Proceedings Article | 3 October 2018 Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Calibration, Etching, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Critical dimension metrology

Showing 5 of 24 publications
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