Dr. Christian M. Chovino
Engineering Manager at Toppan Photomasks Inc
SPIE Involvement:
Publications (14)

Proceedings Article | 27 May 2009 Paper
Joseph Gordon, Marianna Silova, Brid Connolly, Jeroen Huijbregtse, Nicolae Maxim, Larry Frisa, Christian Chovino, Colleen Weins
Proceedings Volume 7470, 74700C (2009) https://doi.org/10.1117/12.835174
KEYWORDS: Air contamination, Reticles, Photomasks, Pellicles, Humidity, Lithography, Contamination, Manufacturing, Contamination control, Optical lithography

Proceedings Article | 30 October 2007 Paper
Joseph Gordon, Larry Frisa, Christian Chovino, David Chan, John Keagy, Colleen Weins
Proceedings Volume 6730, 67301E (2007) https://doi.org/10.1117/12.747145
KEYWORDS: Air contamination, Reticles, Photomasks, Humidity, Contamination, Inspection, Atmospheric particles, Semiconducting wafers, Data modeling, Semiconductors

Proceedings Article | 11 May 2007 Paper
Joseph Gordon, David Chan, Larry Frisa, Colleen Weins, Christian Chovino, John Keagy, Steve Mahoney, Frank Chen, Makoto Kozuma, Kyoko Kuroki, Takahiro Matsuura
Proceedings Volume 6607, 660707 (2007) https://doi.org/10.1117/12.728920
KEYWORDS: Air contamination, Photomasks, Reticles, Pellicles, Atmospheric particles, Sulfur, Gases, Nitrogen, Semiconducting wafers, Semiconductors

Proceedings Article | 3 May 2007 Paper
Steve Osborne, Valentine Baudiquez, Thomas Rode, Christian Chovino, Hidekazu Takahashi, Eric Woster
Proceedings Volume 6533, 65331D (2007) https://doi.org/10.1117/12.736531
KEYWORDS: Particles, Cavitation, Acoustics, Head, Aluminum, Photomasks, Reflection, Reflectivity, Wave plates, Scanning electron microscopy

Proceedings Article | 20 October 2006 Paper
Uwe Dersch, Rico Buettner, Christian Chovino, Steffen Franz, Torben Heins, Holger Herguth, Jan Hendrik Peters, Thomas Rode, Florian Letzkus, Joerg Butschke, Mathias Irmscher
Proceedings Volume 6349, 63492G (2006) https://doi.org/10.1117/12.686035
KEYWORDS: Etching, Extreme ultraviolet, Photomasks, Reflectivity, Manufacturing, Extreme ultraviolet lithography, Scanners, Optical lithography, Photoresist processing, Chromium

Showing 5 of 14 publications
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