Dr. Christian M. Chovino
Engineering Manager at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Optical lithography, Contamination, Air contamination, Manufacturing, Pellicles, Humidity, Photomasks, Contamination control

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Reticles, Contamination, Data modeling, Air contamination, Inspection, Humidity, Photomasks, Semiconducting wafers, Atmospheric particles

Proceedings Article | 11 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Semiconductors, Reticles, Air contamination, Gases, Sulfur, Nitrogen, Pellicles, Photomasks, Semiconducting wafers, Atmospheric particles

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Reflection, Particles, Reflectivity, Wave plates, Scanning electron microscopy, Head, Photomasks, Aluminum, Cavitation, Acoustics

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical lithography, Etching, Scanners, Manufacturing, Reflectivity, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

Showing 5 of 14 publications
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