Christian Enkrich
at AMTC
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Semiconductors, Metrology, Data modeling, Spatial frequencies, Manufacturing, Distortion, Image registration, Software development, Photomasks, Process modeling

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Reticles, Metrology, Cadmium, Quartz, Error analysis, Manufacturing, Image registration, Photomasks, Double patterning technology, Critical dimension metrology

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