Christian Holfeld
SPIE Involvement:
Publications (25)

Proceedings Article | 19 September 2018 Paper
Thorsten Krome, Christian Holfeld, Tim Göhler, Pavel Nesladek
Proceedings Volume 10775, 1077511 (2018)
KEYWORDS: Photomasks, Semiconducting wafers, Deep ultraviolet, Printing, Phase shifts, Ozone, Opacity, Mask cleaning, Binary data, Chemistry

Proceedings Article | 10 April 2013 Paper
Christian Holfeld, Heiko Wagner, Anna Tchikoulaeva, Steffen Loebeth, Stephan Melzig, Yulin Zhang, Shinichi Tanabe, Takenori Katoh, Koichi Moriizumi
Proceedings Volume 8681, 868126 (2013)
KEYWORDS: Inspection, Reticles, Semiconducting wafers, Defect inspection, Photomasks, Manufacturing, Factory automation, Defect detection, Wafer manufacturing, Parallel processing

Proceedings Article | 8 November 2012 Paper
Guoxiang Ning, Christian Holfeld, Daniel Fischer, Paul Ackmann, Andre Holfeld, Karin Kurth, Martin Sczyrba, Tino Hertzsch, Rolf Seltmann, Angeline Ho, Fang GN
Proceedings Volume 8522, 85221X (2012)
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Reticles, Photomasks, Phase shifts, Binary data, Printing, Design for manufacturability, Manufacturing, Defect detection

Proceedings Article | 14 October 2011 Paper
Guoxiang Ning, Christian Holfeld, Anna Tchikoulaeva, Martin Sczyrba, Angeline Ho, Karsten Bubke, Soon Yoeng Tan, Andre Holfeld, Byoung Il Choi
Proceedings Volume 8166, 81664D (2011)
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reticles, Particles, Photomasks, Inspection, Glasses, Defect detection, Manufacturing, Metals

Proceedings Article | 14 October 2011 Paper
Guoxiang Ning, Byoung Il Choi, Christian Holfeld, Yee Ta Ngow, Sia Kim Tan, Anna Tchikoulaeva, Fang Hong Gn
Proceedings Volume 8166, 81662N (2011)
KEYWORDS: Reticles, Semiconducting wafers, Critical dimension metrology, Metals, Etching, Photomasks, Multilayers, 3D metrology, Scanners, Metrology

Showing 5 of 25 publications
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