Mr. Christian Holfeld
at GLOBALFOUNDRIES Dresden
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Reticles, Defect detection, Manufacturing, Inspection, Parallel processing, Photomasks, Factory automation, Semiconducting wafers, Wafer manufacturing, Defect inspection

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Reticles, Defect detection, Manufacturing, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, Phase shifts, Design for manufacturability

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Reticles, Defect detection, Metals, Glasses, Particles, Manufacturing, Inspection, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Multilayers, Reticles, Metrology, Etching, Metals, Scanners, 3D metrology, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon, Thin films, Reticles, Contamination, Spectroscopy, Reflectivity, Raman spectroscopy, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Optical lithography, Metals, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Optical proximity correction

Showing 5 of 24 publications
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