Dr. Christian K. Kalus
Chief Technical Officer
SPIE Involvement:
Publications (18)

Proceedings Article | 2 May 2008 Paper
Proceedings Volume 6792, 679207 (2008) https://doi.org/10.1117/12.798520
KEYWORDS: Photomasks, 3D modeling, Optical proximity correction, Data modeling, Process modeling, SRAF, Data processing, Computer simulations, Electromagnetism, Lithography

Proceedings Article | 15 March 2006 Paper
Christian Kalus, Hinderk Buß, Peter Brooker
Proceedings Volume 6154, 61541S (2006) https://doi.org/10.1117/12.654770
KEYWORDS: Mathematical modeling, Lithography, Diffusion, Optical lithography, Photoresist materials, Systems modeling, Process modeling, Differential equations, Calibration, Finite element methods

Proceedings Article | 2 June 2004 Paper
Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568025
KEYWORDS: Reticles, Photomasks, Manufacturing, Process control, Electrons, Optical spheres, Electron beam lithography, Lithography, Optical proximity correction, Semiconducting wafers

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518049
KEYWORDS: Photomasks, Reflectivity, Extreme ultraviolet, Multilayers, Near field, Finite-difference time-domain method, Extreme ultraviolet lithography, 3D modeling, Image segmentation, Lithography

Proceedings Article | 19 November 2003 Paper
Proceedings Volume 4829, (2003) https://doi.org/10.1117/12.530047
KEYWORDS: Lithography, Semiconducting wafers, Photoresist materials, Photomasks, Diffraction, Finite-difference time-domain method, Microelectronics, Computer simulations, Silicon, Light wave propagation

Showing 5 of 18 publications
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