Dr. Christian K. Kalus
Chief Technical Officer
SPIE Involvement:
Publications (18)

Proceedings Article | 2 May 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Data modeling, Computer simulations, 3D modeling, Data processing, Photomasks, Optical proximity correction, SRAF, Electromagnetism, Process modeling

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Mathematical modeling, Lithography, Optical lithography, Calibration, Diffusion, Photoresist materials, Differential equations, Finite element methods, Systems modeling, Process modeling

Proceedings Article | 2 June 2004
Proc. SPIE. 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Electron beam lithography, Reticles, Optical spheres, Electrons, Manufacturing, Process control, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Multilayers, Finite-difference time-domain method, Image segmentation, Reflectivity, 3D modeling, Near field, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 19 November 2003
Proc. SPIE. 4829, 19th Congress of the International Commission for Optics: Optics for the Quality of Life
KEYWORDS: Lithography, Diffraction, Finite-difference time-domain method, Silicon, Computer simulations, Photoresist materials, Microelectronics, Photomasks, Semiconducting wafers, Light wave propagation

Showing 5 of 18 publications
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