Dr. Christian Laubis
at Physikalisch-Technische Bundesanstalt
SPIE Involvement:
Author
Publications (37)

PROCEEDINGS ARTICLE | July 6, 2018
Proc. SPIE. 10699, Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray
KEYWORDS: Telescopes, Mirrors, Cameras, Sensors, Calibration, Interferometry, Frequency modulation, Extreme ultraviolet, Fermium, Optical alignment

PROCEEDINGS ARTICLE | April 23, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Scattering, Scanners, Particles, Silicon, Hydrogen, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Nanostructures, Diffraction, Scattering, Sensors, X-rays, Laser scattering, Scatterometry, Extreme ultraviolet, Charge-coupled devices, Diffraction gratings

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Thin films, Lithography, Metals, X-rays, Nickel, Manufacturing, Cobalt, Photomasks, Extreme ultraviolet, Chemical elements

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Wafer-level optics, Carbon, Particles, Reflectivity, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Optical properties, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 37 publications
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