Dr. Christian Piel
at RI Research Instruments GmbH
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Thin films, Metrology, Reflection, Scanners, Reflectivity, Pellicles, Precision measurement, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Semiconductors, Optical components, Metrology, Reflectivity, Control systems, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Optical filters, Mirrors, Metrology, Reflection, Scanners, Reflectivity, Pellicles, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Optical filters, Metrology, Reflection, Scanners, Reflectivity, Reflectometry, Photomasks, Extreme ultraviolet, Charge-coupled devices, Extreme ultraviolet lithography

Proceedings Article | 14 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Carbon, Optical filters, Scanners, Reflectivity, Pellicles, Extreme ultraviolet

Showing 5 of 8 publications
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