Christian Sparka
at KLA GmbH
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Optical parametric oscillators, Scanners, Error analysis, Control systems, Process control, High volume manufacturing, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Lithography, Optical design, Metrology, Matrices, Scanners, Scatterometry, Finite element methods, Semiconducting wafers, Scatter measurement

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Semiconductors, Metrology, Databases, Image processing, Time metrology, High volume manufacturing, Optical alignment, Intelligence systems, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Optical design, Metrology, Data modeling, Databases, Metals, Image segmentation, Signal processing, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 16 April 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Optical design, Metrology, Sensors, Spectroscopy, Scatterometry, Signal processing, Semiconducting wafers, Wafer testing, Overlay metrology

Showing 5 of 6 publications
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