Dr. Christian Wies
at AIXUV GmbH
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Metrology, Particles, Reflectivity, Quality measurement, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Factor analysis

PROCEEDINGS ARTICLE | April 16, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Optical lithography, Spectroscopy, Inspection, Reflectivity, Process control, Extreme ultraviolet, Charge-coupled devices, Geometrical optics, Spectrophotometry, EUV optics

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Mirrors, Electrodes, Scanners, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | August 29, 2006
Proc. SPIE. 6317, Advances in X-Ray/EUV Optics, Components, and Applications
KEYWORDS: Gold, Optical components, Calibration, Spectroscopy, Silicon, Reflectivity, CCD cameras, Spectral resolution, Transmittance, Spectrophotometry

PROCEEDINGS ARTICLE | June 16, 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Metrology, Reflectivity, Magnetism, Xenon, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | June 16, 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Multilayers, Metrology, Etching, Dry etching, Inspection, Reflectivity, Process control, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 13 publications
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