Dr. Christian Wies
SPIE Involvement:
Publications (13)

Proceedings Article | 27 May 2009 Paper
Azadeh Farahzadi, Christian Wies, Rainer Lebert
Proceedings Volume 7470, 74700E (2009) https://doi.org/10.1117/12.835176
KEYWORDS: Reflectivity, Extreme ultraviolet, Photomasks, Reflectometry, High volume manufacturing, Metrology, Quality measurement, Extreme ultraviolet lithography, Particles, Factor analysis

Proceedings Article | 16 April 2008 Paper
H. Blaschke, I. Balasa, L. Koch, K. Starke, D. Ristau, C. Wies, R. Lebert, A. Bayer, F. Barkusky, K. Mann
Proceedings Volume 6922, 692228 (2008) https://doi.org/10.1117/12.772859
KEYWORDS: Extreme ultraviolet, Spectrophotometry, EUV optics, Spectroscopy, Reflectivity, Inspection, Process control, Optical lithography, Geometrical optics, Charge-coupled devices

Proceedings Article | 3 May 2007 Paper
Vivek Bakshi, Rainer Lebert, Bernhard Jägle, Christian Wies, Uwe Stamm, Juergen Kleinschmidt, Guido Schriever, Christian Ziener, Marc Corthout, Joseph Pankert, Klaus Bergmann, Willi Neff, André Egbert, Deborah Gustafson
Proceedings Volume 6533, 653315 (2007) https://doi.org/10.1117/12.737183
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Xenon, Plasma, Tin, Electrodes, Photomasks, Scanners, Lithography, Mirrors

Proceedings Article | 29 August 2006 Paper
Proceedings Volume 6317, 631701 (2006) https://doi.org/10.1117/12.686878
KEYWORDS: Reflectivity, Spectroscopy, Transmittance, Spectrophotometry, CCD cameras, Silicon, Optical components, Spectral resolution, Gold, Calibration

Proceedings Article | 16 June 2005 Paper
Rainer Lebert, Bernhard Jagle, Christian Wies, Uwe Stamm, Juergen Kleinschmidt, Kai Gaebel, Guido Schriever, Joseph Pankert, Klaus Bergmann, Willi Neff, Andre Egbert
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637333
KEYWORDS: Extreme ultraviolet, Plasma, Extreme ultraviolet lithography, Lithography, Metrology, Xenon, Photomasks, Tin, Reflectivity, Magnetism

Showing 5 of 13 publications
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