Dr. Christian Wies
at AIXUV GmbH
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Reflectivity, Extreme ultraviolet, Photomasks, Reflectometry, High volume manufacturing, Metrology, Quality measurement, Extreme ultraviolet lithography, Particles, Factor analysis

PROCEEDINGS ARTICLE | April 16, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Extreme ultraviolet, Spectrophotometry, EUV optics, Spectroscopy, Reflectivity, Inspection, Process control, Optical lithography, Geometrical optics, Charge-coupled devices

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Xenon, Plasma, Tin, Electrodes, Photomasks, Scanners, Lithography, Mirrors

PROCEEDINGS ARTICLE | August 29, 2006
Proc. SPIE. 6317, Advances in X-Ray/EUV Optics, Components, and Applications
KEYWORDS: Reflectivity, Spectroscopy, Transmittance, Spectrophotometry, CCD cameras, Silicon, Optical components, Spectral resolution, Gold, Calibration

PROCEEDINGS ARTICLE | June 16, 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Extreme ultraviolet, Plasma, Extreme ultraviolet lithography, Lithography, Metrology, Xenon, Photomasks, Tin, Reflectivity, Magnetism

PROCEEDINGS ARTICLE | June 16, 2005
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Extreme ultraviolet, Photomasks, Multilayers, Extreme ultraviolet lithography, Metrology, Reflectivity, Dry etching, Inspection, Etching, Process control

Showing 5 of 13 publications
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