Dr. Christian D. Zuniga
SPIE Involvement:
Publications (21)

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Wafer-level optics, Data modeling, Scattering, Calibration, Printing, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Binary data, Model-based design

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Finite-difference time-domain method, Lithographic illumination, Cadmium, Reflection, Image processing, Silicon, 3D modeling, Printing, Solids, Process control, Field effect transistors, Computational lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Anisotropy

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Data modeling, Calibration, Electrons, 3D modeling, Scanning electron microscopy, Monte Carlo methods, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Cadmium, Calibration, Etching, Diffusion, 3D modeling, Optical proximity correction, SRAF, Convolution, System on a chip, Systems modeling

SPIE Journal Paper | 6 November 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Optical proximity correction, Calibration, Diffusion, Cadmium, 3D modeling, Semiconducting wafers, Critical dimension metrology, Photoresist processing, SRAF, Etching

Showing 5 of 21 publications
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