Dr. Christiane Jehoul
Process Engineer at imec
SPIE Involvement:
Publications (13)

Proceedings Article | 5 October 2023 Paper
Oktay Yildirim, Richard van Haren, Orion Mouraille, Ilirjan Aliaj, Jan Hermans, Christiane Jehoul
Proceedings Volume 12802, 128020Q (2023) https://doi.org/10.1117/12.2675473
KEYWORDS: Etching, Semiconducting wafers, Overlay metrology, Plasma, Chemistry, Reticles, Polymers, Ions, Discontinuities, Polymerization

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 124960I (2023) https://doi.org/10.1117/12.2658084
KEYWORDS: Ruthenium, Optical alignment, Semiconducting wafers, Overlay metrology, Oxides, Silicon, Metals, Etching, Scanners, Copper

Proceedings Article | 26 May 2022 Presentation + Paper
Gian Francesco Lorusso, Christophe Beral, Janusz Bogdanowicz, Danilo De Simone, Mahmudul Hasan, Christiane Jehoul, Alain Moussa, Mohamed Saib, Mohamed Zidan, Joren Severi, Vincent Truffert, Dieter Van den Heuvel, Alex Goldenshtein, Kevin Houchens, Gaetano Santoro, Daniel Fischer, Angelika Muellender, Joey Hung, Roy Koret, Igor Turovets, Kit Ausschnitt, Chris Mack, Tsuyoshi Kondo, Tomoyasu Shohjoh, Masami Ikota, Anne-Laure Charley, Philippe Leray
Proceedings Volume 12053, 120530O (2022) https://doi.org/10.1117/12.2614046
KEYWORDS: Fourier transforms, Signal to noise ratio, Metrology, Line width roughness, Scanning electron microscopy, Semiconducting wafers, Atomic force microscopy, Scatterometry, Extreme ultraviolet lithography, Image quality

Proceedings Article | 30 March 2017 Paper
Proceedings Volume 10147, 101471C (2017) https://doi.org/10.1117/12.2259750
KEYWORDS: Far infrared, Optical alignment, Semiconducting wafers, Sensors, Signal detection, Avalanche photodetectors, Signal processing, Scanners, Optical lithography, Overlay metrology

Proceedings Article | 28 March 2017 Paper
Proceedings Volume 10145, 101451J (2017) https://doi.org/10.1117/12.2257848
KEYWORDS: Silica, Overlay metrology, Scanning electron microscopy, Semiconductors, Semiconductor manufacturing, Manufacturing, Photomasks, Semiconducting wafers, Lithography, Scanners, Optical lithography, Sensors

Showing 5 of 13 publications
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