Christina Deverich
Process Engineer at GlobalFoundries
SPIE Involvement:
Publications (6)

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 59923C (2005)
KEYWORDS: FT-IR spectroscopy, Nitrogen, Chemically amplified resists, Contamination, Chemical analysis, Compact discs, Chlorine, Photomasks, Reticles, Control systems

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003)
KEYWORDS: Critical dimension metrology, Chemically amplified resists, Cadmium, Scanning electron microscopy, Electron beam lithography, Mask making, Photomasks, Electron beams, Beam shaping, Quartz

Proceedings Article | 28 August 2003 Paper
Wu-Song Huang, Wei He, Wenjie Li, Wayne Moreau, Robert Lang, David Medeiros, Karen Petrillo, Arpan Mahorowala, Marie Angelopoulos, Christina Deverich, Chester Huang, Paul Rabidoux
Proceedings Volume 5130, (2003)
KEYWORDS: Etching, Photomasks, Polymers, Silicon, Chromium, Semiconducting wafers, Mask making, Resistance, Lithography, Scanning electron microscopy

Proceedings Article | 27 December 2002 Paper
Karen Petrillo, David Medeiros, Jim Bucchignano, Marie Angelopoulos, Dario Goldfarb, Wu-Song Huang, Wayne Moreau, Robert Lang, Chester Huang, Christina Deverich, Thomas Cardinali
Proceedings Volume 4889, (2002)
KEYWORDS: Photomasks, Mask making, Photoresist materials, Chemically amplified resists, Semiconducting wafers, Polymers, Scanning electron microscopy, Electron beam lithography, Lithography, Oxides

Proceedings Article | 1 August 2002 Paper
Christina Deverich, Andrew Watts, Paul Rabidoux, Thomas Cardinali, William Aaskov, Peter Levin, Wu-Song Huang, Wayne Moreau, Marie Angelopoulos, Karen Petrillo, David Madeiros
Proceedings Volume 4754, (2002)
KEYWORDS: Photomasks, Etching, Opacity, Critical dimension metrology, Resistance, Chemically amplified resists, Packaging, Lithography, Temperature metrology, Mask making

Showing 5 of 6 publications
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