Christina Deverich
Process Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, FT-IR spectroscopy, Contamination, Nitrogen, Control systems, Photomasks, Compact discs, Chemical analysis, Chlorine, Chemically amplified resists

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Electron beams, Cadmium, Quartz, Scanning electron microscopy, Photomasks, Beam shaping, Mask making, Critical dimension metrology, Chemically amplified resists

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Etching, Polymers, Silicon, Resistance, Chromium, Scanning electron microscopy, Photomasks, Mask making, Semiconducting wafers

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Oxides, Lithography, Electron beam lithography, Polymers, Scanning electron microscopy, Photoresist materials, Photomasks, Mask making, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 1 August 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Packaging, Lithography, Opacity, Etching, Resistance, Photomasks, Mask making, Critical dimension metrology, Temperature metrology, Chemically amplified resists

Showing 5 of 6 publications
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