Christina Turley
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Reticles, Extreme ultraviolet, Scanners, Overlay metrology, Distortion, Manufacturing, Extreme ultraviolet lithography, Photomasks, High volume manufacturing, Lithography

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet lithography, Error analysis, Lithographic illumination, Reticles, Overlay metrology, Distortion, Statistical analysis

Proceedings Article | 26 September 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Reticles, Defect detection, Lithography, Error analysis, Optical proximity correction, Sensors, Attenuators

SPIE Journal Paper | 12 April 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Semiconducting wafers, Metals, Extreme ultraviolet lithography, Multilayers, Etching, Deep ultraviolet, Scanning electron microscopy

Proceedings Article | 19 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Extreme ultraviolet, Defect inspection, Wafer inspection, Optical inspection, Wafer-level optics, Nonlinear optics, Optical simulations, Extreme ultraviolet lithography, Defect detection

Showing 5 of 9 publications
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