Dr. Christof T. Bodendorf Profile

Dr. Christof T. Bodendorf

R&D optical design and engineering at Max-Planck-Institut für Extraterrestrische Physik

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- Since 2013: Max-Planck-Institute for extraterrestrial physics:
Optical Engineer and designer for the ‘Euclid’ space mission. Development of lens systems, optical measurement setups for wave-front- and point-spread-function Measurements, diffractive optics with computer generated holograms.

- Since 2000: Infineon Technologies AG:
Development engineer. Computational optical micro-lithography. Development of resolution enhancement techniques.

2000 Doctoral Thesis in physics at the LMU-München in the field of quantum optics.

Proceedings Article | 16 September 2019 Presentation + Paper

Euclid warm testing of the near-infrared optical assembly using a unique combination of CGH interferometry and tactile precision measurements

Frank Grupp, Jennifer Kaminski, Christof Bodendorf, Norbert Geis, Daniela Penka, Ralf Bender

Proceedings Volume 11116, 1111618 (2019) https://doi.org/10.1117/12.2527723

KEYWORDS: Optical fabrication, Near infrared, Computer generated holography, Interferometry, Precision measurement

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Proceedings Article | 9 September 2019 Presentation + Paper

Testing the near-infrared optical assembly of the space telescope Euclid

Christof Bodendorf, Norbert Geis, Frank Grupp, Jennifer Kaminski, Reinhard Katterloher, Ralf Bender

Proceedings Volume 11116, 111160Y (2019) https://doi.org/10.1117/12.2529114

KEYWORDS: Space telescopes, Wavefront analysis, Point spread functions, Cameras, Wavefronts, Sensors, Telescopes, Optical testing, Diffraction, Optical fabrication, Mirrors, Monochromatic aberrations

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Proceedings Article | 5 January 2018 Open Access

Development and verification of high precision cryogenic lens holders

C. Gal, E. Gubbini, H. Thiele, A. Mottaghibonab, T. Leberle, B. Hilber, M. Vongehr, A. Boesz, H. Gebler, T. Sedlmaier, A. Meister, M. Gerstmeier, A. Mecsaci, B. Kusch, F. Grupp, C. Wimmer, A. Bode, C. Bodendorf, D. Penka, R. Katterloher, N. Geis, R. Bender

Proceedings Volume 10563, 105634G (2018) https://doi.org/10.1117/12.2304246

KEYWORDS: Sensors, Cryogenics, Astronomical imaging, Interfaces, Photometry, Galactic astronomy, Diamond turning, Manufacturing, Spectroscopes, Baryon acoustic oscillations

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Proceedings Article | 30 October 2017 Presentation + Paper

Diffractive optics for precision alignment of Euclid space telescope optics

Jean-Michel Asfour, Frank Weidner, Christof Bodendorf, Andreas Bode, Alexander Poleshchuk, Ruslan Nasyrov, Frank Grupp, Ralf Bender

Proceedings Volume 10401, 104010V (2017) https://doi.org/10.1117/12.2274349

KEYWORDS: Optical alignment, Telescopes, Computer generated holography, Interferometry, Precision optics, Optical components, Integrated optics, Fizeau interferometers, Cameras, Calibration

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Proceedings Article | 29 July 2016 Paper

Final tolerancing approach and the value of short-cutting tolerances by measurement

Frank Grupp, Eric Prieto, Norbert Geis, Andreas Bode, Christof Bodendorf, Anne Costille, Reinhard Katterloher, Daniela Penka, Ralf Bender

Proceedings Volume 9904, 99042M (2016) https://doi.org/10.1117/12.2231362

KEYWORDS: Tolerancing, Tolerancing, Space telescopes, Computer generated holography, Assembly tolerances, Refractive index, Telescopes, Optical alignment, Interferometry, Staring arrays, Optical design

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Proceedings Article | 30 June 2016 Paper

Performance measurement of high precision optical assemblies for cosmological observations: comparison of different approaches

Chr. Bodendorf, A. Bode, N. Geis, D. Penka, F. Grupp, R. Bender

Proceedings Volume 10009, 100090F (2016) https://doi.org/10.1117/12.2235210

KEYWORDS: Wavefronts, Sensors, Point spread functions, Modulation transfer functions, Optical testing, Cameras, Diffraction, Stray light, Optical fibers, Image acquisition

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Proceedings Article | 28 August 2014 Paper

The EUCLID NISP tolerancing concept and results

Frank Grupp, Eric Prieto, Norbert Geis, Andreas Bode, Reinhard Katterloher, Christof Bodendorf, Daniela Penka, Ralf Bender

Proceedings Volume 9143, 91432X (2014) https://doi.org/10.1117/12.2055398

KEYWORDS: Tolerancing, Spectroscopy, Computer generated holography, Lenses, Space operations, Image quality, Electroluminescent displays, Assembly tolerances, Space telescopes, Monte Carlo methods

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Proceedings Article | 26 September 2013 Paper

A tolerancing approach taking into account the interferometric alignment scheme of the EUCLID NISP space optics

Frank Grupp, Eric Prieto, Norbert Geis, Andreas Bode, Reinhard Katterloher, Christof Bodendorf, Martin Becker, Stephanie Bogner, Ralf Bender

Proceedings Volume 8860, 88600G (2013) https://doi.org/10.1117/12.2023264

KEYWORDS: Tolerancing, Computer generated holography, Space telescopes, Telescopes, Optical alignment, Interferometry, Spectroscopy, Galactic astronomy, Image quality, Photometry

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Proceedings Article | 28 March 2007 Paper

Modular process modeling for OPC

M. Keck, C. Bodendorf, T. Schmidtling, R. Schlief, R. Wildfeuer, S. Zumpe, M. Niehoff

Proceedings Volume 6520, 652044 (2007) https://doi.org/10.1117/12.716295

KEYWORDS: Optical proximity correction, Process modeling, Data modeling, Photoresist processing, Etching, Error analysis, Scanning electron microscopy, 3D modeling, Wafer-level optics, Statistical modeling

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Proceedings Article | 20 March 2006 Paper

Benchmark of numerical versus analytical proximity curve calculations

Roderick Köhle, Christof Bodendorf, Wolfgang Hoppe

Proceedings Volume 6154, 61542Q (2006) https://doi.org/10.1117/12.656884

KEYWORDS: Solids, System on a chip, Computer simulations, Error analysis, Image resolution, Optical proximity correction, Optical simulations, Apodization, Image analysis, Diffraction

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Proceedings Article | 5 November 2005 Paper

OPC with customized asymmetric pupil illumination fill

Christof Bodendorf, Jens Haßmann, Thomas Mülders, Karin Kurth, Jörg Thiele

Proceedings Volume 5992, 599224 (2005) https://doi.org/10.1117/12.632159

KEYWORDS: Optical proximity correction, Silicon, Data modeling, Diffusion, Process modeling, Photomasks, Semiconducting wafers, Lithographic illumination, Anisotropy, Distortion

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Proceedings Article | 28 June 2005 Paper

Simulation based OPC for contact pattern using 193 nm lithography

Martin Keck, Christof Bodendorf, Jorg Thiele, Alberto Gomez, Ying-Chung Tseng, Teng-Yen Huang

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617215

KEYWORDS: Optical proximity correction, Photomasks, Data modeling, Semiconducting wafers, Lithography, Printing, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Phase shifts

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Proceedings Article | 28 May 2004 Paper

Impact of measured pupil illumination fill distribution on lithography simulation and OPC models

Christof Bodendorf, Ralph Schlief, Ralf Ziebold

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535575

KEYWORDS: Optical proximity correction, Process modeling, Lithographic illumination, Lithography, Scanners, Photomasks, Head, Computer simulations, Optical lithography, Coherence imaging

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