Dr. Christof Klein
Director Operations at IMS Nanofabrication GmbH
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 16 August 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019

Proceedings Article | 25 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Optical microscopes, Inspection, Scanning electron microscopy, Photomasks, Line width roughness, Beam shaping, Optical proximity correction, Nanofabrication, Standards development, Vestigial sideband modulation

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Metrology, Logic, Calibration, Inspection, Image registration, Photomasks, Line width roughness, Beam shaping, Nanofabrication, Vestigial sideband modulation

SPIE Journal Paper | 2 August 2013
JM3 Vol. 12 Issue 03
KEYWORDS: Photomasks, Semiconducting wafers, Electron beam direct write lithography, Electron beam lithography, Nanofabrication, Lithography, Beam shaping, Optical proximity correction, Wafer-level optics, Electron beams

Proceedings Article | 26 March 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Photomasks, Line width roughness, Beam shaping, Electron beam direct write lithography, Semiconducting wafers, Nanofabrication, Vestigial sideband modulation

Showing 5 of 21 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top