Christof Krautschik
Technology Manager at Intel Corp
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Mirrors, Polishing, Deep ultraviolet, Scattering, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Point spread functions, Mirrors, Polishing, Cadmium, Spatial frequencies, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Point spread functions, Mirrors, Deep ultraviolet, Spatial frequencies, Fourier transforms, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Modulation transfer functions, Critical dimension metrology

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Point spread functions, Mirrors, Cadmium, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Convolution, Critical dimension metrology

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Point spread functions, Mirrors, Polishing, Spatial frequencies, Surface roughness, Wavefronts, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Finite-difference time-domain method, Cadmium, Opacity, Chromium, Computer simulations, Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Phase shifts

Showing 5 of 12 publications
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