Dr. Christoph Dolainsky
Manager/Client Services at PDF Solutions GmbH
SPIE Involvement:
Publications (6)

Proceedings Article | 5 July 2000 Paper
Christoph Dolainsky, Paul Karakatsanis, Fritz Gans, Rainer Pforr, Joerg Thiele
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388952
KEYWORDS: Photomasks, Lithography, Computer simulations, Printing, Phase shifts, Image transmission, Transmittance, Optical proximity correction, Scanning electron microscopy, Manufacturing

Proceedings Article | 3 February 2000 Paper
Kai Peter, Volodymyr Ordynskyy, Christoph Dolainsky, Hans Hartmann, Hans-Juergen Brueck
Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377100
KEYWORDS: Photomasks, Inspection, Optical proximity correction, Databases, Semiconducting wafers, Data storage, Image processing, Device simulation, Optical lithography, Phase shifts

Proceedings Article | 26 July 1999 Paper
Joerg Thiele, Christoph Friedrich, Christoph Dolainsky, Paul Karakatsanis, Wilhelm Maurer
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354367
KEYWORDS: Optical proximity correction, Chromium, Phase shifts, Photomasks, Critical dimension metrology, Lithography, Binary data, Image segmentation, Computer simulations, Printing

Proceedings Article | 29 June 1998 Paper
Wilhelm Maurer, Christoph Dolainsky, Joerg Thiele, Christoph Friedrich, Paul Karakatsanis
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310754
KEYWORDS: Process modeling, Data modeling, Optical proximity correction, Photomasks, Software development, Lithography, Mask making, Data processing, Mathematical modeling, Reticles

Proceedings Article | 7 July 1997 Paper
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275995
KEYWORDS: Optical proximity correction, Photoresist processing, Data modeling, Computer simulations, Etching, Coherence (optics), Data processing, Lithography

Showing 5 of 6 publications
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