Dr. Christoph Dolainsky
Manager/Client Services at PDF Solutions GmbH
SPIE Involvement:
Publications (6)

Proceedings Article | 5 July 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Lithography, Manufacturing, Computer simulations, Scanning electron microscopy, Printing, Image transmission, Transmittance, Photomasks, Optical proximity correction, Phase shifts

Proceedings Article | 3 February 2000
Proc. SPIE. 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Optical lithography, Data storage, Databases, Image processing, Inspection, Photomasks, Optical proximity correction, Semiconducting wafers, Device simulation, Phase shifts

Proceedings Article | 26 July 1999
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Lithography, Image segmentation, Chromium, Computer simulations, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Binary data, Phase shifts

Proceedings Article | 29 June 1998
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Mathematical modeling, Lithography, Reticles, Data modeling, Data processing, Software development, Photomasks, Optical proximity correction, Mask making, Process modeling

Proceedings Article | 7 July 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Lithography, Coherence (optics), Data modeling, Etching, Computer simulations, Data processing, Optical proximity correction, Photoresist processing

Proceedings Article | 12 February 1997
Proc. SPIE. 3236, 17th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Lithography, Etching, Image processing, Silver, Manufacturing, Head, Photomasks, Optical proximity correction, Mask making, Photoresist processing

Showing 5 of 6 publications
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