Dr. Christoph K. Hohle
Team Manager Technology Development SLM at Fraunhofer-Institut für Photonische Mikrosysteme IPMS
SPIE Involvement:
Conference Program Committee | Author | Editor
Area of Expertise:
Patterning , Photoresists , E-Beam Lithography , MEMS / MOEMS
Websites:
Publications (49)

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12958, 1295809 (2024) https://doi.org/10.1117/12.3010154
KEYWORDS: Actuators, Optical lithography, Spatial light modulators, Lithography, Semiconducting wafers, Overlay metrology, Holography, Microelectromechanical systems, Reactive ion etching, Micromirrors

Proceedings Article | 2 March 2022 Presentation + Paper
Proceedings Volume 12013, 1201306 (2022) https://doi.org/10.1117/12.2608081
KEYWORDS: Actuators, Mirrors, Spatial light modulators, Microelectromechanical systems, Computer generated holography, Holography, Micromirrors, 3D displays, Finite element methods, Mixed reality

Proceedings Article | 5 March 2021 Presentation + Paper
Christoph Hohle, Sebastian Döring, Martin Friedrichs, Andreas Gehner, Dirk Rudloff, Matthias Schulze, Ronald Stübner, Daniela Trenkler
Proceedings Volume 11697, 116970V (2021) https://doi.org/10.1117/12.2583036
KEYWORDS: Microelectromechanical systems, Spatial light modulators, Semiconducting wafers, Mirrors, Lithography, Wafer-level optics, System on a chip, Surface micromachining, Optical lithography, Microopto electromechanical systems

Proceedings Article | 28 February 2020 Paper
A. Gehner, S. Döring, D. Rudloff, D. Kunze, P. Dürr, S. Francés, L. Hänsel, H. Torlee, A. Elgner, M. Eckert, M. Friedrichs, J. Heber, J. Schmidt, W. Pufe, C. Hohle, M. Schulze, M. Wagner
Proceedings Volume 11293, 1129302 (2020) https://doi.org/10.1117/12.2543052
KEYWORDS: Mirrors, Actuators, Micromirrors, Optical lithography, Calibration, Analog electronics, CMOS technology

Proceedings Article | 21 March 2016 Paper
Matthias Rudolph, Silvio Esche, Christoph Hohle, Dirk Schumann, Philipp Steinke, Xaver Thrun, Justus von Sonntag
Proceedings Volume 9779, 977919 (2016) https://doi.org/10.1117/12.2220156
KEYWORDS: Advanced cleaning techniques, Mask cleaning, Fluid dynamics, Microfluidics, Semiconducting wafers, Water, Silicon, Photoresist processing, Chemistry, Particles, Scanning electron microscopy, Plasma etching, Photoresist materials, Polymers, Plasma

Showing 5 of 49 publications
Proceedings Volume Editor (5)

SPIE Conference Volume | 23 May 2018

SPIE Conference Volume | 2 May 2017

SPIE Conference Volume | 6 June 2016

SPIE Conference Volume | 23 April 2015

SPIE Conference Volume | 16 April 2014

Conference Committee Involvement (19)
Advances in Patterning Materials and Processes XLI
26 February 2024 | San Jose, California, United States
Advances in Patterning Materials and Processes XL
27 February 2023 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIX
25 April 2022 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVIII
22 February 2021 | Online Only, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
Showing 5 of 19 Conference Committees
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