Dr. Christoph K. Hohle
Team Manager-Nanopatterning at Fraunhofer Institute for Photonic Microsystems
SPIE Involvement:
Conference Program Committee | Conference Chair | Conference Co-Chair | Editor | Author
Area of Expertise:
Patterning , Photoresists , E-Beam Lithography , MEMS / MOEMS
Websites:
Publications (50)

SPIE Conference Volume | May 23, 2018

SPIE Conference Volume | May 2, 2017

SPIE Conference Volume | June 6, 2016

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Microfluidics, Polymers, Water, Particles, Silicon, Chemistry, Scanning electron microscopy, Photoresist materials, Plasma etching, Photoresist processing, Semiconducting wafers, Fluid dynamics, Mask cleaning, Plasma, Advanced cleaning techniques

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Electron beam lithography, Electron beams, Sensors, Metals, Image processing, Electrons, Inspection, Scanning electron microscopy, Wafer inspection, Semiconducting wafers, Tin, Defect inspection

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Photovoltaics, Point spread functions, Electron beams, Scattering, Calibration, Computer simulations, Cadmium sulfide, Critical dimension metrology, Algorithm development, Semiconducting wafers

Showing 5 of 50 publications
Conference Committee Involvement (14)
Advances in Patterning Materials and Processes XXXVI
25 February 2019 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXV
27 February 2018 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIV
28 February 2017 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIII
29 February 2016 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXII
24 February 2015 | San Jose, California, United States
Showing 5 of 14 published special sections
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